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1·This model also has a dual wind shield to reduce proximity effect.

这种模式也有双重挡风板，以减少邻近效应。

2·The proximity effect in the E-beam lithography system was verified by experiments.

利用电子束曝光机完成有关邻近效应的实验。

3·The proximity effect in the SDS-3 E-beam lithography system is verified by experiments.

利用SDS - 3电子束曝光机完成有关邻近效应的试验。

4·Make full use of the current proximity effect and the effect of gap, it is necessary to add the magnetizer.

充分利用电流的临近效应和缺口效应，有必要时加导磁体。

5·Many different schemes have been devised to minimize the proximity effect, such as pattern size correction and dose modulation.

有多种方法对邻近效应进行修正如剂量调整、图形调整等。

6·The internal proximity effect correction in the electron beam lithography based on the variation of the pattern shape was studied.

针对三维曝光图形的结构特点，结合重复增量扫描方式，分别从水平和深度两个方向进行邻近效应校正。

7·The experiment results show that the method is effective to devise complex phase? Shifting masks and the proximity effect is decreased.

实验结果表明该方法对复杂相移掩模的设计有效，可以减小邻近效应。

8·By Fourier transform, produces a fast and accurate calculation for dose precompensation in proximity effect correction for electron beam lithography.

将付里叶变换法运用于电子束曝光的邻近效应校正中，形成了快速、准确的剂量校正法。

9·Piezoresistivity of ecac may involve proximity effect, microcrack and the staggered arrangements of conductive pass-ways due to shear strength of aggregates.

压敏产生的原因是导电沥青混凝土试件的压缩邻近效应、微裂纹和石料间的剪切力使部分导电通路错位。

10·The present results not only can help to optimize the exposure conditions in Electron Beam Lithography, but also supply more accurate data for proximity effect correction.

本文的模拟结果不仅能为高能电子束光刻工艺优化曝光条件、降低邻近效应提供理论指导，而且能为进一步的邻近效应的校正提供更精确的数据。