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1·This paper analyses the blocking voltage, forward voltage drop, photoresist mask design and gate-triggering and dynamic characteristics of high-power thyristors.

本文对大功率可控硅的阻断电压问题、正向压降问题、光刻掩模板的设计问题、控制极特性问题以及动特性问题进行了分析。

2·A small undesired hole in an oxide opaque region of a mask or reticle or in a photoresist layer.

氧化物、掩模或标线的不透明区域，或光刻层中不需要的小孔。

3·We developed a non silicon surface micro machining process with two or three mask electroplating layers and using polyimide or photoresist as sacrificial layers.

我们研制的非硅表面微机械工艺采用两次或三次掩模电镀层，聚酰亚胺和光刻胶分别作为底层和第二、第三层的牺牲层。

4·Photoresist grating was fabricated by holography, and it was used in the mask of ion etching.

采用全息法制备了光刻胶光栅，并用该光栅掩膜离子蚀刻。

5·The results indicate that the technology using aluminum as the mask is superior to that using the thick photoresist as the mask in AWG fabrication.

结果表明，在AWG器件制作工艺上，铝掩模技术明显优于厚胶掩模技术。